| 摘要 |
<P>PROBLEM TO BE SOLVED: To consecutively generate EUV pulses at a repetition rate larger than 5 kHz with a pulse panel of at least 10 mJ/sr. <P>SOLUTION: A plurality of source modules 1 of the same structure are disposed in a uniform distribution around the optical axis 4 of a source within a vacuum chamber 5 so as to provide consecutive radiation pulses at one point on the optical axis 4, each of which generating radiation-emitting plasmas and having a convergent EUV radiation. A reflective device 2 which is rotatably supported around the optical axis 4 consecutively in time deflects the convergent radiation emitted by the source module 1 towards the optical axis 4. A synchronizer 3 depends on an actual rotation position of the reflective device 2 and a pulse repetition frequency previously set by the rotation speed to rotate and activate the source module 1 consecutively. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
