| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a projection exposure apparatus which is suitable for repeatedly exposing an exposure pattern such as a discontinuous pattern, and is small in size and low-cost, and also provide a projection exposure method and a manufacturing method of a member to be exposed. <P>SOLUTION: This projection aligner comprises an illumination system 7 which irradiates light on a mask 4 having a mask pattern of a plurality of rows for repeatedly exposing the exposure pattern of the plurality of rows; a projection system 2 which projects light from the mask pattern on the member to be exposed; an exposure stage 5 which moves the member exposed in the direction in which the row of the discontinuous pattern is located; and a control means 8 which causes optical irradiation on the mask from an illumination system, and the step driving of an exposure stage which moves the member to be exposed by the amount of n times the pitch of the row of the discontinuous pattern, to be alternately performed. By accompanying the step driving of the exposure stage in an initial period and a final period of the repetitive exposure of the exposure pattern, the control means makes the step driving of the mask stage 5 perform, and moves the mask by the amount of n times the array pitch of the mask pattern. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
