| 摘要 |
PROBLEM TO BE SOLVED: To provide an inductively coupled plasma chemical vapor deposition apparatus where a uniform thin film can be formed on a rectangular substrate used for a flat panel display device. SOLUTION: The apparatus is provided with a process chamber where the inside forms a sealed space and at least the upper wall body is formed of a dielectric, a radio frequency antenna installed so as to be close to the upper wall body at the outside of the process chamber and fed with electric power by electric power application part, a gas injection nozzle having a central gas injection nozzle installed at the center of the upper wall body in the lower part of the radio frequency antenna and an outline gas injection nozzle installed in the upper part of the chamber body in the process chamber, and a substrate fixing part located in the lower part at the inside of the process chamber and whose upper part is mounted with a substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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