SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To improve maintenance work efficiency and operation coefficient of a substrate processing apparatus by easily removing a reaction byproduct deposited on an exhaust pipe and thereby remarkably alleviating the maintenance work. SOLUTION: The manufacturing method of semiconductor device is provided with a function to remove a deposition 48 adhered to the pipe wall by providing a deposition removing body 43 which can shift within a pipe 27, and by shifting the deposition removing body within the pipe. COPYRIGHT: (C)2005,JPO&NCIPI