| 摘要 |
A device and a method for wavefront measurement of an optical imaging system, and a microlithography projection exposure machine that is equipped with such a device. The device has a wavefront generating unit that includes an optical element ( 1 ) with an object-side periodic structure ( 2 ), and a light source unit ( 20,21 ) for illuminating the object-side periodic structure with the aid of a measuring radiation. The device also has a detector unit that is arranged on the image side of the imaging system to be measured and that includes an optical element ( 3 ) with an image-side periodic structure, and a detector element ( 52, 52 a , 52 b) for detecting an overlay pattern of the imaged object-side periodic structure and image-side periodic structure. The wavefront generating unit is designed to restrict the angular spectrum ( 6 ) of the measuring radiation emanating from a respective field point ( 7 ), the design being such that the measuring radiation emanating from the respective field point illuminates only in each case a specific subregion of a pupil plane of the optical imaging system.
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