发明名称 REACTIVE METAL SOURCES AND DEPOSITION METHOD FOR THIOALUMINATE PHOSPHORS
摘要 A physical vapour deposition method for the deposition of thioaluminate phosphor compositions comprises providing one or more source materials comprising an intermetallic barium aluminum compound, a barium aluminum allo y or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminanc e and colors required for TV applications.
申请公布号 CA2554756(A1) 申请公布日期 2005.09.15
申请号 CA20052554756 申请日期 2005.03.04
申请人 IFIRE TECHNOLOGY CORP. 发明人 ACCHIONE, JOE;KOSYACHKOV, ALEXANDER;GUO, LIU;XINGWEI WU, JAMES ALEXANDER ROBERT STILES;XU, YUE (HELEN)
分类号 C23C14/34;C09K11/70;C23C14/06;C23C16/00 主分类号 C23C14/34
代理机构 代理人
主权项
地址