发明名称 |
REACTIVE METAL SOURCES AND DEPOSITION METHOD FOR THIOALUMINATE PHOSPHORS |
摘要 |
A physical vapour deposition method for the deposition of thioaluminate phosphor compositions comprises providing one or more source materials comprising an intermetallic barium aluminum compound, a barium aluminum allo y or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminanc e and colors required for TV applications.
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申请公布号 |
CA2554756(A1) |
申请公布日期 |
2005.09.15 |
申请号 |
CA20052554756 |
申请日期 |
2005.03.04 |
申请人 |
IFIRE TECHNOLOGY CORP. |
发明人 |
ACCHIONE, JOE;KOSYACHKOV, ALEXANDER;GUO, LIU;XINGWEI WU, JAMES ALEXANDER ROBERT STILES;XU, YUE (HELEN) |
分类号 |
C23C14/34;C09K11/70;C23C14/06;C23C16/00 |
主分类号 |
C23C14/34 |
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