发明名称 SUBSTRATE FOR MAGNETIC RECORDING MEDIUM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate used for a magnetic recording medium, securing head floating stability by controlling surface roughness of the surface of the substrate and having a magnetic film capable of attaining high recording density, and to provide a surface roughening method. SOLUTION: In the silicon substrate used for the magnetic recording medium, the surface used for forming a recording layer has protrusions of 40 to 1,000 pieces/μm<SP>2</SP>and average surface roughness of 0.3 to 2.0 nm and the protrusions have≤10 nm maximum height and the entire surface has no damage and no dirt. The manufacturing method of the silicon substrate for the magnetic recording medium comprises an etching step of the surface of the silicon substrate including application of a supersonic wave to the surface of the silicon substrate and rocking or rotation of the silicon substrate. The magnetic recording medium comprises the silicon substrate. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005251266(A) 申请公布日期 2005.09.15
申请号 JP20040058601 申请日期 2004.03.03
申请人 SHIN ETSU CHEM CO LTD 发明人 SHINTANI HISAFUMI;YAMAGATA NORIO
分类号 G11B5/73;B32B1/00;G11B5/66;G11B5/84;H01L21/308;(IPC1-7):G11B5/73 主分类号 G11B5/73
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