发明名称 |
ISOTROPIC HIGH-PRESSURE APPLYING DEVICE FOR X-RAY DIFFRACTION ANALYSIS |
摘要 |
PROBLEM TO BE SOLVED: To provide an isotropic high-pressure applying device for X-ray diffraction analysis, capable of applying good controllability of about 1.5 GPa or lower and hydrostatic pressure of high uniformity, by constituting the window part of a clamping type high-pressure cell of beryllium high with strong transmission intensity for the X-rays. SOLUTION: This clamping type high-pressure applying device is used for analyzing the structure of a substance under isotropic hydrostatic pressure and is equipped with the window part having X-ray transmissivity provided to the sample chamber part, in which the pressure medium and the substance are sealed. The window part is constituted of beryllium, and a seal member molded from a fluoroplastic is mounted inside the window member. COPYRIGHT: (C)2005,JPO&NCIPI
|
申请公布号 |
JP2005249461(A) |
申请公布日期 |
2005.09.15 |
申请号 |
JP20040057378 |
申请日期 |
2004.03.02 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION;KYOWA SEISAKUSHO:KK |
发明人 |
HASEGAWA TATSUO;KUMAI REIJI;TAKAHASHI YUKIHIRO;TOKURA YOSHINORI;SAWA HIROSHI;TOYOSHIMA SATOAKI |
分类号 |
G01N23/20;G21K5/00;G21K5/02;(IPC1-7):G01N23/20 |
主分类号 |
G01N23/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|