发明名称 ISOTROPIC HIGH-PRESSURE APPLYING DEVICE FOR X-RAY DIFFRACTION ANALYSIS
摘要 PROBLEM TO BE SOLVED: To provide an isotropic high-pressure applying device for X-ray diffraction analysis, capable of applying good controllability of about 1.5 GPa or lower and hydrostatic pressure of high uniformity, by constituting the window part of a clamping type high-pressure cell of beryllium high with strong transmission intensity for the X-rays. SOLUTION: This clamping type high-pressure applying device is used for analyzing the structure of a substance under isotropic hydrostatic pressure and is equipped with the window part having X-ray transmissivity provided to the sample chamber part, in which the pressure medium and the substance are sealed. The window part is constituted of beryllium, and a seal member molded from a fluoroplastic is mounted inside the window member. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005249461(A) 申请公布日期 2005.09.15
申请号 JP20040057378 申请日期 2004.03.02
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION;KYOWA SEISAKUSHO:KK 发明人 HASEGAWA TATSUO;KUMAI REIJI;TAKAHASHI YUKIHIRO;TOKURA YOSHINORI;SAWA HIROSHI;TOYOSHIMA SATOAKI
分类号 G01N23/20;G21K5/00;G21K5/02;(IPC1-7):G01N23/20 主分类号 G01N23/20
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