发明名称 |
Negative photoresist and method of using thereof |
摘要 |
A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; a multihydroxy-containing additive; and a resist polymer comprising a first repeating unit from a first monomer. The resist polymer may also comprise a second repeating unit from a second monomer, wherein the second monomer has an aqueous base soluble moiety. The multihydroxy-containing additive has the structure Q-(OH)<SUB>m</SUB>, where Q may include at least one alicycic group and m may be any integer between 2 and 6. The acid generator is adapted to generate an acid upon exposure to radiation. The resist polymer is adapted to chemically react with the additive in the presence of the acid to generate a product that is insoluble in a developer solution.
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申请公布号 |
US2005202339(A1) |
申请公布日期 |
2005.09.15 |
申请号 |
US20040798157 |
申请日期 |
2004.03.11 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LI WENJIE;VARANASI PUSHKARA R. |
分类号 |
G03C1/492;(IPC1-7):G03C1/492 |
主分类号 |
G03C1/492 |
代理机构 |
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主权项 |
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地址 |
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