发明名称 VACUUM TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus that is compact, has a small installation area, can be maintained easily, and can easily mount and remove devices. SOLUTION: The vacuum treatment apparatus comprises a vacuum container that has a sidewall whose position is fixed to the installation floor surface while the inside and outside can be sealed; a sample stand that is arranged inside the vacuum container and places a sample to be treated on it; a nearly cylindrical inner wall member that surrounds the side of the sample stand between the sample stand and the sidewall, is arranged with a gap to the sidewall, and forms plasma in the inside; a flange section arranged at the periphery of the upper and lower end sections of the inner wall member; and an exhausting means for reducing pressure at the space between the inner wall member and the sidewall of the vacuum container and at the inside of the inner wall member. The inner wall member is fixed to the inside of the vacuum container by allowing the upper and lower end sections to receive force from the member in contact with the upper and lower end sections while the pressure in the inside of the vacuum container is reduced, and the flange section is pressed while pinching a seal for sealing the inside and outside of the inner wall member by receiving the force. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005252201(A) 申请公布日期 2005.09.15
申请号 JP20040064638 申请日期 2004.03.08
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MAKINO AKITAKA;KIHARA HIDEKI;TAUCHI TSUTOMU
分类号 H01L21/3065;C23C16/00;H01L21/02;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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