发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which has discharge electrodes inside a processing container and in which a discharge state can easily be confirmed. SOLUTION: A heat insulating member 208 is installed in such a way that at least a part of the processing container 203 forming a substrate storing space and a pair of electrodes 269 and 270 is covered. A window 251 for confirming the discharge state in a pair of the electrodes 269 and 270 is arranged in the processing container 203. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005251775(A) |
申请公布日期 |
2005.09.15 |
申请号 |
JP20040055789 |
申请日期 |
2004.03.01 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
YAMAZAKI HIROHISA;KAGAYA TORU |
分类号 |
C23C16/52;H01L21/31;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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