发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which has discharge electrodes inside a processing container and in which a discharge state can easily be confirmed. SOLUTION: A heat insulating member 208 is installed in such a way that at least a part of the processing container 203 forming a substrate storing space and a pair of electrodes 269 and 270 is covered. A window 251 for confirming the discharge state in a pair of the electrodes 269 and 270 is arranged in the processing container 203. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005251775(A) 申请公布日期 2005.09.15
申请号 JP20040055789 申请日期 2004.03.01
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YAMAZAKI HIROHISA;KAGAYA TORU
分类号 C23C16/52;H01L21/31;(IPC1-7):H01L21/31 主分类号 C23C16/52
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