| 发明名称 |
METHOD FOR PRODUCING AN EXPOSED SUBSTRATE |
| 摘要 |
The invention relates to a method for producing an exposed substrate consisting of at least two different image areas. The inventive substrate is provided with at least two photoresistant layers which are adapted to the image areas to be produced. |
| 申请公布号 |
WO2004077493(A3) |
申请公布日期 |
2005.09.15 |
| 申请号 |
WO2004EP01816 |
申请日期 |
2004.02.24 |
| 申请人 |
GIESECKE & DEVRIENT GMBH;KAULE, WITTICH |
发明人 |
KAULE, WITTICH |
| 分类号 |
G03F7/00;G03F7/095;G03F7/20;G03H1/02 |
主分类号 |
G03F7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
