| 摘要 |
An improved deposition baffle (50), that is provided to protect a dielectric window from conductive deposits, is provided in high-density-plasma apparatus. The baffle has a central circular part having slots (51) cut therein that are interrupted by electrically conductive bridges. Ribs (52) in the body between the slots have cooling fluid channel sections (60) bored therein, which are joined in series by interconnecting channel portions in a peripheral annular part of the baffle to form a continuous serpentine cooling fluid flow path from an inlet (61) to an outlet (62) in the annular peripheral part of the baffle.
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