发明名称 CHEMICAL TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a chemical treatment apparatus and its method capable of replacement or reproduction processing of filtration members, such as filters, without stopping chemical treatment. SOLUTION: The chemical treatment apparatus 100 consists of a chemical tank 1, a chemical treatment tub 2, a chemical circulation line La, and a pump P1 and a first filtration member 3a installed at the line La. A second filtration member 3b is installed, in parallel with the first filtration member 3a at the line La. In this case, the apparatus 100 additionally has a cleaning liquid circulation line Lb, where the first and second filtration members 3a and 3b are connected in parallel. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005251936(A) 申请公布日期 2005.09.15
申请号 JP20040059403 申请日期 2004.03.03
申请人 ST LCD KK 发明人 NAKAMURA MOTONORI;IWATSUKI MASAYA
分类号 H01L21/306;H01L21/304;(IPC1-7):H01L21/306 主分类号 H01L21/306
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