| 摘要 |
PROBLEM TO BE SOLVED: To provide a contact resistance evaluation element which can measure a contact resistance without limiting a conductive layer, to provide a method of manufacturing the same, and to provide an evaluation method of the contact resistance. SOLUTION: First and second contact resistance valuation electrodes 21, 23 and a common electrode 25 are formed by ohmic contact so as to be embedded in an insulating film 15 formed on a semiconductor substrate 11. The first and second contact resistance evaluation electrodes are disposed at a symmetrical position to the common electrode, and the area of the first contact resistance evaluation electrode is different from that of the second contact resistance valuation electrode. COPYRIGHT: (C)2005,JPO&NCIPI
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