| 发明名称 |
Process to optimize properties of polymer pellicles and resist for lithography applications |
| 摘要 |
Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
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| 申请公布号 |
US2005203254(A1) |
申请公布日期 |
2005.09.15 |
| 申请号 |
US20040799435 |
申请日期 |
2004.03.12 |
| 申请人 |
TREGUB ALEXANDER;ESCHBACH FLORENCE;LO FU-CHANG;HOLL SUSAN M. |
发明人 |
TREGUB ALEXANDER;ESCHBACH FLORENCE;LO FU-CHANG;HOLL SUSAN M. |
| 分类号 |
C08F114/18;(IPC1-7):C08F114/18 |
主分类号 |
C08F114/18 |
| 代理机构 |
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代理人 |
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