| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method and a pattern forming device forming the pattern with good yield, hardly generating foreign substance on a pattern forming substrate when forming the pattern thereon. SOLUTION: In the pattern forming method, forming the pattern while removing the foreign substance by arranging a foreign substance removing mechanism in a zone of the liquid removal treatment of (c), the following treatment processes (a)-(c) are carried out; (a) a development treatment of removing an unnecessary portion for pattern forming by immersing the pattern forming substrate in a liquid and/or by jet spraying the liquid on the pattern forming substrate, (b) a cleaning treatment for cleaning the pattern by immersing the pattern forming substrate in a liquid and/or jet spraying the liquid on the pattern forming substrate after the above development treatment, and (c) a liquid removal treatment for removing the liquid used in the above treatment (a) and/or (b) by an air knife. COPYRIGHT: (C)2005,JPO&NCIPI |
