| 发明名称 |
SOLVENT AND REMOVING METHOD OF RESIDUE CONTAINING SILICON FROM SUBSTRATE USING THE SOLVENT |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a removing method of a residue containing silicon from at least a part of the upper surface and the backside of a coated substrate and/or a depositing device. SOLUTION: This problem is solved by the removing method of the residue including treatment that the coated substrate and/or the depositing device are treated with a removing solvent. COPYRIGHT: (C)2005,JPO&NCIPI
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| 申请公布号 |
JP2005252260(A) |
申请公布日期 |
2005.09.15 |
| 申请号 |
JP20050057222 |
申请日期 |
2005.03.02 |
| 申请人 |
AIR PRODUCTS & CHEMICALS INC |
发明人 |
WEIGEL SCOTT J;KHOT SHRIKANT N;MORRIS-OSKANIAN ROSALEEN PATRICIA;MAYORGA STEVEN GERARD;MACDOUGALL JAMES EDWARD;SENECAL LEE |
| 分类号 |
H01L21/31;B05D3/00;H01L21/306;H01L21/3213;(IPC1-7):H01L21/31 |
主分类号 |
H01L21/31 |
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