| 摘要 |
The invention relates to a sub-20 nm nanofiller for use in a matrix material, to the matrix resulting therefrom, to a process for preparing said matrix, and to the use of said nanofiller, the nanofiller comprising functionalized polyhedral oligomeric silicon-oxygen cluster units of the formula <?in-line-formulae description="In-line Formulae" end="lead"?>[(R<SUB>a</SUB>X<SUB>b</SUB>SiO<SUB>1.5</SUB>)<SUB>m</SUB>(R<SUB>c</SUB>X<SUB>d</SUB>SiO)<SUB>n</SUB>(R<SUB>e</SUB>X<SUB>f</SUB>Si<SUB>2.05</SUB>)<SUB>o</SUB>(R<SUB>g</SUB>X<SUB>h</SUB>Si<SUB>2</SUB>O<SUB>2</SUB>)<SUB>p</SUB>]<?in-line-formulae description="In-line Formulae" end="tail"?> with: a, b, c=0-1; d=1-2; e, g, f=0-3; h=1-4; m.b+n.d+o.f+p.h<=4; m+n+o+p>=4; a+b=1; c+d=2; e+f=3 and g+h=4; R=hydrogen atom, alkyl, cycloalkyl, alkenyl, cycloalkenyl, alkynyl, cycloalkynyl, aryl, heteroaryl group or polymer unit, which are in each case substituted or unsubstituted, or further functionalized polyhedral oligomeric silicon-oxygen cluster units, which are attached by way of a polymer unit or a bridging unit, X=oxy, hydroxyl, alkoxy, carboxyl, silyl, alkylsilyl, alkoxysilyl, siloxy, alkylsiloxy, alkoxysiloxy, silylalkyl, alkoxysilylalkyl, alkylsilylalkyl, halogen, epoxy, ester, fluoroalkyl, isocyanate, blocked isocyanate, acrylate, methacrylate, nitrile, amino, phosphine group or substituents of the type R containing at least one such group of the type X, the substituents of the type R being identical or different and the substituents of the type X being identical or different, with the proviso that there are not more than four substituents of the type X per cluster unit.
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