发明名称 LASER LIGHT SOURCE DEVICE, EXPOSURE APPARATUS USING THIS LASER LIGHT SOURCE DEVICE, AND MASK EXAMINING DEVICE
摘要 A laser light source device (1) comprising M laser light sources the frequencies of which are shifted from the fundamental frequency by (m-1).a.Deltaomega, a first laser light source section (2) and a first fiber amplifier section (4) both for amplifying the laser beams, a first optical multiplexer (6) for generally coaxially superimposing the laser beams outputted from the first fiber amplifier section (4) and outputting the resultant laser beam, and a first wavelength converter (9) for multiplying by A the frequency of the laser beam outputted from the first optical multiplexer (6), M laser light sources the frequencies of which are shifted from the fundamental frequency by (m-1).b.Deltaomega, a second laser light section (3) and a second fiber amplifier section (5) both for amplifying the laser beams, a second optical multiplexer (7) generally coaxially superimposing the laser beams outputted from the second fiber amplifier section (5) and outputting the resultant laser beam, a second wavelength converter (10) for multiplying by B the frequency of the laser beam outputted from the second optical multiplexer (7) and a third wavelength converter (11) for simultaneously receiving the laser beams outputted from the first and second wavelength converters (9, 10) and converting them into a laser beam having a frequency of (A+B) times the fundamental frequency, wherein A.a + B.b=0 is satisfied.
申请公布号 WO2005085947(A1) 申请公布日期 2005.09.15
申请号 WO2005JP04381 申请日期 2005.03.07
申请人 NIKON CORPORATION;KAWAI, HITOSHI 发明人 KAWAI, HITOSHI
分类号 G02F1/37;G03F1/00;G03F7/20;H01L21/027;H01S3/23;H04J14/08 主分类号 G02F1/37
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