INSPECTION METHOD FOR CHARGED PARTICLE BEAM MASK, INSPECTION APPARATUS FOR CHARGED PARTICLE BEAM MASK AND CHARGED PARTICLE BEAM MASK DATA STRUCTURE

摘要

PROBLEM TO BE SOLVED: To inspect masks for transferring patterns by using two or more masks so as to relieve a pseudo defect in a part where no problem is caused from the viewpoint of a device while keeping the inspection accuracy in a pattern region.

SOLUTION: A pseudo defect is relieved by dividing a pattern into a stitching part and the other pattern portion on comparing the mask image to mask data and by decreasing the defect detection sensitivity in the stitching part than that in the pattern portion.

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