发明名称 EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD OF FABRICATING THE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device capable of well performing an exposure process and a measurement process through liquid. <P>SOLUTION: An exposure device EX exposes a substrate P by irradiating the substrate through liquid LQ with exposure light EL. The exposure device EX has a substrate holder PH for holding the substrate P, a substrate stage PST movable with the substrate P held on the substrate holder PH, and a temperature regulation system 60 for regulating the temperature of the substrate holder PH. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005252247(A) 申请公布日期 2005.09.15
申请号 JP20050027377 申请日期 2005.02.03
申请人 NIKON CORP 发明人 KOBAYASHI NAOYUKI;YAMATO SOICHI;HIRUKAWA SHIGERU;OMURA YASUHIRO
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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