发明名称 Non-activated guard ring for semiconductor devices
摘要 A guard ring is formed in a semiconductor region that is part of a Schottky junction or Schottky diode. The guard ring is formed by ion implantation into the semiconductor contact layer without completely annealing the semiconductor contact layer to form a high resistance region. The guard ring may be located at the edge of the layer or, alternatively, at a distance away from the edge of the layer. A Schottky metal contact is formed atop the layer, and the edges of the Schottky contact are disposed atop the guard ring.
申请公布号 US2005202661(A1) 申请公布日期 2005.09.15
申请号 US20040935000 申请日期 2004.09.07
申请人 CERUZZI ALEX;POPHRISTIC MILAN;SHELTON BRYAN S.;LIU LINLIN;MURPHY MICHAEL;ZHU TING G. 发明人 CERUZZI ALEX;POPHRISTIC MILAN;SHELTON BRYAN S.;LIU LINLIN;MURPHY MICHAEL;ZHU TING G.
分类号 H01L21/44;(IPC1-7):H01L21/44 主分类号 H01L21/44
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