| 摘要 |
<p>Film forming equipment and a film forming method, by which a film forming process can be performed immediately after aligning a substrate with a mask, a substrate transfer system between different types of chambers is eliminated and a film can be continuously formed. In a same vacuum chamber (2), an alignment unit (3) for aligning the substrate (5) with the mask (6), a transfer tray (4) for receiving the substrate (5) and the mask (6) from the alignment unit (3), and a plurality of film forming sources (81A)-(81F) which are arranged along a transfer path of the transfer tray (4) are provided. To transfer the substrate (5) and the mask (6) between the alignment unit (3) and the transfer tray (4), a magnet holder (61) is separated from a magnet lifting mechanism (12) through a locking part (67).</p> |
