LASER EXPOSURE OF PHOTOSENSITIVE MASKS FOR DNA MICROARRAY FABRICATION,申请号EP20030814412-传众专利搜索

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发明名称	LASER EXPOSURE OF PHOTOSENSITIVE MASKS FOR DNA MICROARRAY FABRICATION
摘要
申请公布号	EP1573396(A2)	申请公布日期	2005.09.14
申请号	EP20030814412	申请日期	2003.11.26
申请人	INTEL CORPORATION	发明人	RAO, VALLURI;YAMAKAWA, MINEO;BERLIN, ANDREW
分类号	B01J19/00;B05D3/00;C12M1/34;C12Q1/68;G03F1/00;G03F7/20;(IPC1-7):G03F1/00	主分类号	B01J19/00
代理机构		代理人
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