发明名称 Thin film device supply body and method of fabricating tha same and its use in a transfer method
摘要 <p>The present invention aims to provide a technique in which a layer to be transferred is easily peeled and transferred to a transferred body that has pliability or flexibility. Also, the present invention aims to provide a method of fabricating a semiconductor device using these peeling and transfer techniques, and electronic equipment fabricated with the semiconductor device. In order to solve the above-mentioned problems, a transfer method in which a layer to be transferred formed on a substrate is transferred to a transfer body that has pliability or flexibility includes the first step of forming a layer to be transferred on a substrate; the second step of bonding the layer to be transferred formed on the substrate to a transfer body having pliability or flexibility fixed on a fixture; and the third step of peeling the layer to be transferred from the substrate and transferring the layer to be transferred to the transfer body. &lt;IMAGE&gt; &lt;IMAGE&gt; &lt;IMAGE&gt; &lt;IMAGE&gt; &lt;IMAGE&gt; &lt;IMAGE&gt; &lt;IMAGE&gt; &lt;IMAGE&gt;</p>
申请公布号 EP1575085(A2) 申请公布日期 2005.09.14
申请号 EP20050005004 申请日期 2005.03.08
申请人 JP 发明人 JP;JP
分类号 H01L21/68;H01L51/00;H01L51/40;(IPC1-7):H01L21/68 主分类号 H01L21/68
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