METHOD FOR FABRICATING FINE PATTERN OF SEMICONDUCTOR DEVICES,申请号KR20040015777-传众专利搜索

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发明名称	METHOD FOR FABRICATING FINE PATTERN OF SEMICONDUCTOR DEVICES
摘要
申请公布号	KR20050090615(A)	申请公布日期	2005.09.14
申请号	KR20040015777	申请日期	2004.03.09
申请人	HYNIX SEMICONDUCTOR INC.	发明人	YOO, TAE JUN
分类号	H01L21/027;(IPC1-7):H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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