发明名称 Method for surface treatment of substrates
摘要 Process for surface treatment of band shaped substrates with at least one glow discharge hollow cathode where at least one hollow cathode glow discharge is produced via a hollow cathode the discharge space of which is defined by the band-shaped substrate and at least one counter-electrode and the electric discharge is carried out within the pressure range 0.01-1000 mbar. An independent claim is included for improving the utilization of a steel band substrate, e.g. by application of a melt dip coating with preliminary oxide layer activation.
申请公布号 EP1575078(A1) 申请公布日期 2005.09.14
申请号 EP20050005020 申请日期 2005.03.08
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 JUNG, THOMAS, DR. RER.NAT.
分类号 C23C14/02;C23C14/34;C23C14/56;H01J37/32 主分类号 C23C14/02
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