发明名称 CONTAMINANT REDUCING SUBSTRATE TRANSPORT AND SUPPORT SYSTEM
摘要 A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of reducing abrasion and contamination of a substrate that contacts the contact surface. In one version, the support structure has a dielectric covering an electrode. A plurality of mesas on the dielectric have a coating with the contact surface thereon. In another version, contamination of substrate is reduced by providing a substrate lifting assembly having a pair of arcuate fins with raised protrusions to support the substrates.
申请公布号 WO2005083752(A2) 申请公布日期 2005.09.09
申请号 WO2005US05672 申请日期 2005.02.23
申请人 APPLIED MATERIALS, INC.;PARKHE, VIJAY, D.;LEOPOLD, MATTHEW;RONAN, TIMOTHY;MARTIN, TODD, W.;NG, EDWARD;KHURANA, NITIN;SUH, SONG-MOON;FAY, RICHARD;HAGERTY, CHRISTOPHER;RICE, MICHAEL;ANGELO, DARRYL;AHMAN, KURT, J.;TSAI, MATTHEW, C.;SANSONI, STEVE 发明人 PARKHE, VIJAY, D.;LEOPOLD, MATTHEW;RONAN, TIMOTHY;MARTIN, TODD, W.;NG, EDWARD;KHURANA, NITIN;SUH, SONG-MOON;FAY, RICHARD;HAGERTY, CHRISTOPHER;RICE, MICHAEL;ANGELO, DARRYL;AHMAN, KURT, J.;TSAI, MATTHEW, C.;SANSONI, STEVE
分类号 H01L21/683;H01L21/687 主分类号 H01L21/683
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