| 摘要 |
<p>A particle deposited substrate can be manufactured by using an atmospheric plasma sputtering method, without using expensive vacuum equipment. Particles can be grown at a low temperature of 200°C or below, and the various nano-order particles of a metal or its oxide with controlled particle diameter, particle density, patterning and integration degree directly adhere by themselves even in a primary particle status with excellent adhesiveness without using an adhesive medium such as binder, filler, etc. in between.</p> |
