发明名称 ION SOURCE WITH CONTROLLED SUPERPOSITION OF ELECTROSTATIC AND GAS FLOW FIELDS
摘要 Ion source devices with controlled superposition of electrostatic and gas fl ow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus comprising such ion source devices, and methods for use are presented.
申请公布号 CA2604820(A1) 申请公布日期 2005.09.09
申请号 CA20052604820 申请日期 2005.02.22
申请人 GEMIO TECHNOLOGIES, INC. 发明人 HIEKE, ANDREAS
分类号 H01J3/14;G21K1/08;H01J49/04 主分类号 H01J3/14
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