semiconductor wafer washing system and washing-solution supply method thereof,申请号KR20010001732-传众专利搜索

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发明名称	semiconductor wafer washing system and washing-solution supply method thereof
摘要
申请公布号	KR100513397(B1)	申请公布日期	2005.09.09
申请号	KR20010001732	申请日期	2001.01.12
申请人		发明人
分类号	H01L21/304;B08B3/04;B08B7/00;H01L21/00;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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