PHOTORESIST FILM REMOVING DEVICE AND METHOD

摘要

A photoresist film removing device (1) for removing a photoresist film formed on a substrate (S) with ozone water comprising a table (10) having a smooth upper surface (10a) provided with a first recess (12) for containing the substrate (S), a cover member (20) having a smooth surface (20a) facing to the upper surface (10a) of the table and provided with a second recess (22) such that the circumferential edge part of the second recess (22) abuts against the upper surface (10a) of the table to enclose the second recess (22), and a supply section (24) and a discharge section (26) located on the opposite sides of the first recess (12) and communicating with the second recess (22). The photoresist film removing device can remove the photoresist film quickly and infallibly using ozone water.