发明名称 |
Method of optimizing inkjet printheads using a plasma-etching process |
摘要 |
A method for creating an inkjet chamber. The method comprises the steps of firstly providing a substrate having a nozzle opening and secondly etching the substrate through the nozzle opening by alternating between anisotropic and isotropic etching processes for forming a chamber having a shape approximating a cylinder by using multiple hemispheric etches.
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申请公布号 |
US2005193558(A1) |
申请公布日期 |
2005.09.08 |
申请号 |
US20040795050 |
申请日期 |
2004.03.05 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
SHANTHARAMA LINGADAHALLLI G.;LEBENS JOHN A.;STEPHANY THOMAS M. |
分类号 |
B41J2/14;B41J2/16;(IPC1-7):B41J2/14 |
主分类号 |
B41J2/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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