发明名称 Method of optimizing inkjet printheads using a plasma-etching process
摘要 A method for creating an inkjet chamber. The method comprises the steps of firstly providing a substrate having a nozzle opening and secondly etching the substrate through the nozzle opening by alternating between anisotropic and isotropic etching processes for forming a chamber having a shape approximating a cylinder by using multiple hemispheric etches.
申请公布号 US2005193558(A1) 申请公布日期 2005.09.08
申请号 US20040795050 申请日期 2004.03.05
申请人 EASTMAN KODAK COMPANY 发明人 SHANTHARAMA LINGADAHALLLI G.;LEBENS JOHN A.;STEPHANY THOMAS M.
分类号 B41J2/14;B41J2/16;(IPC1-7):B41J2/14 主分类号 B41J2/14
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