SYSTEM AND METHOD FOR CONTINUOUS ARC VAPOR DEPOSITION BY A PLURALITY OF USABLE TARGETS

摘要

PROBLEM TO BE SOLVED: To provide an arc vapor deposition system which can be continuously used for a long period of time and permits more efficient adjustment of target ejection faces. SOLUTION: The arc vapor deposition system is equipped with a vacuum evacuatable chamber and a means which is a means for positioning two or more targets into the chamber and is capable of positioning the first target to an operating position and the other target to a standby position. The system is provided with an electric power supply source for supplying electric power to the target held in the operating position. The system is provided with a means for preparing the ejection face of the target positioned in the standby position and putting the same into a predetermined form. In turn or in combination with the surface preparation means the system is provided with a means for inspecting whether or not the ejection face of the target positioned in the standby position has the predetermined form. The positioning means is preferably so constituted as to exchange the two or more targets in the predetermined time. COPYRIGHT: (C)2005,JPO&NCIPI