| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition capable of forming a high resolution resist pattern with good rectangularity and reduced LER, and to provide a pattern forming method using the positive resist composition. <P>SOLUTION: In the positive resist composition containing a resin component (A) having an acid-dissociable dissolution inhibiting group and alkali solubility increased by the action of an acid and an acid generator component (B) which generates an acid upon exposure, the resin component (A) contains a copolymer (A1) comprising a constitutional unit (a1) represented by formula (I), wherein part of the hydroxyl groups is protected by replacing the hydrogen atom thereof with the above acid-dissociable dissolution inhibiting group, and a constitutional unit (a2) represented by formula (II), and having a mass average molecular weight of ≤16,000. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
