| 摘要 |
<P>PROBLEM TO BE SOLVED: To perform exposure processing under a state where the optical system is stabilized thermally. <P>SOLUTION: The image of a pattern is projected, by exposure light, to a substrate 112 through the optical element of a projection optical system 114. An intercepting unit S intercepts the exposure light directed from the optical element toward the substrate 112 when the optical element is preheated with the exposure light. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
