发明名称 System and method for process contamination prevention for semiconductor manufacturing
摘要 Provided are a system and method for preventing contamination in a semiconductor manufacturing environment. The method includes comparing one or more attributes associated with a product, such as a substrate, with one or more attributes associated with an operation. If the comparison indicates that the product is not compatible with the operation, then the operation is suspended with respect to the product. If the comparison indicates that the product is compatible with the operation, then the operation is performed on the product.
申请公布号 US2005197730(A1) 申请公布日期 2005.09.08
申请号 US20040791930 申请日期 2004.03.03
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 HSU CHIH-WEI;LU SPAN;HSU KUANG-HUAN;LIN CHEN-YUNG;LIN SHUI-TIEN;LIN CHUN-HUNG
分类号 G06F17/50;G06F19/00;H01L21/00;(IPC1-7):G06F19/00 主分类号 G06F17/50
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