发明名称 |
Method for performing transmission tuning of a mask pattern to improve process latitude |
摘要 |
A method of generating a mask for use in a photolithography process. The method includes the steps of determining a target mask pattern having a plurality of features to be imaged and an illumination system to be utilized to image the mask; identifying a critical pitch within the target pattern and optimizing illumination settings of the illumination system for imaging the critical pitch; identifying a forbidden pitch within the target pattern; and modifying the transmittance of the features having a pitch equal to or substantially equal to the forbidden pitch such that the exposure latitude of the features equal to or substantially equal to the forbidden pitch is increased.
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申请公布号 |
US2005196682(A1) |
申请公布日期 |
2005.09.08 |
申请号 |
US20040981762 |
申请日期 |
2004.11.05 |
申请人 |
HSU STEPHEN D.;CHEN JANG F.;SHI XUELONG;VAN DEN BROEKE DOUGLAS |
发明人 |
HSU STEPHEN D.;CHEN JANG F.;SHI XUELONG;VAN DEN BROEKE DOUGLAS |
分类号 |
G03F1/08;G03B27/72;G03F1/14;G03F7/20;G03F9/00;G06F17/50;H01L21/027;(IPC1-7):G06F17/50 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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