发明名称 DEVICE AND METHOD FOR DETECTING HOLDING HOLE OF SEMICONDUCTOR WAFER CARRIER AND POLISHING METHOD OF SEMICONDUCTOR WAFER
摘要 <P>PROBLEM TO BE SOLVED: To provide a technology for securely inserting a semiconductor wafer into a holding hole and safely performing polishing at the time of automatically polishing the wafer. <P>SOLUTION: A method detects a position of the holding hole 5 of a carrier 4 holding the wafer used when a double face polishing device polishes the semiconductor wafer. A picture processing means picture-processes data obtained by two picture detecting means 20a and 20b installed to form a prescribed center angle &theta; with respect to the holding hole. Two points on a boundary of the holding hole and polishing cloth 37b are detected, and the center position of the holding hole is calculated based on the detected two points and the center angle. Thus, the position of the holding hole is detected. A conveyance means sets the semiconductor wafer in the holding hole based on the detected position of the holding hole, and the wafer is polished. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005243996(A) 申请公布日期 2005.09.08
申请号 JP20040052986 申请日期 2004.02.27
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 FUJIYAMA KATSURA;HIRANO YOSHIHIRO;IBE HIROYUKI
分类号 B24B49/12;B24B37/27;B24B37/28;H01L21/304 主分类号 B24B49/12
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