发明名称 Magnetic film forming method, magnetic pattern forming method and magnetic recording medium manufacturing method
摘要 At least one ion 6 selected from Cr, Al, Nb and Mo is locally implanted into a thin film 4 containing, as main components, at least one of Fe and Co and at least one of Pd and Pt and a boron ion 20 is then implanted into a whole surface of the thin film subjected to the implantation, and a heat treatment is thereafter carried out, and a portion 7 into which at least one ion 6 selected from Cr, Al, Nb and Mo and the boron ion 20 are implanted becomes a portion 9 having a small coercive force and a portion 8 into which only the boron ion 20 is implanted becomes a portion 10 having a large coercive force.
申请公布号 US2005196546(A1) 申请公布日期 2005.09.08
申请号 US20050052033 申请日期 2005.02.08
申请人 TDK CORPORATION 发明人 AOYAMA TSUTOMU;ISHIO SHUNJI;ITO HIROTAKA
分类号 G11B5/65;C23C14/00;G11B5/673;G11B5/82;G11B5/84;H01F10/16;H01F41/34;(IPC1-7):C23C14/00 主分类号 G11B5/65
代理机构 代理人
主权项
地址