发明名称 GALLIUM NITRIDE-BASED COMPOUND SEMICONDUCTOR MULTILAYER STRUCTURE AND METHOD OF PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a gallium nitride compound semiconductor multilayer structure useful for producing a gallium nitride compound semiconductor light-emitting device which can operate at low voltage while maintaining a satisfactory light emission output. <P>SOLUTION: The gallium nitride-based compound semiconductor multilayer structure comprises an n-type layer, an active layer, and a p-type layer formed on the substrate with the active layer interposed between the n-type layer and the p-type layer, the active layer having a thick film portion and a thin film portion, wherein the active layer has a flat bottom surface (on the substrate side) and an uneven top surface so as to form the thick film portion and the thin film portion. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005244209(A) 申请公布日期 2005.09.08
申请号 JP20050021456 申请日期 2005.01.28
申请人 SHOWA DENKO KK 发明人 MIKI HISAYUKI;SAKURAI TETSURO;TAKEDA HITOSHI
分类号 H01L21/205;H01L33/06;H01L33/22;H01L33/32 主分类号 H01L21/205
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