| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can treat a plurality of substrates uniformly by devising a supply of gas. SOLUTION: Air bubbles are generated inside a processing tank by supplying gas to a bubbler 3 and a tubing bubbler 31. The plurality of substrates W are treated by a processing liquid, and designated treatments are performed by synergistic effect generated by the air bubbles from the bubbler 3 simultaneously. In that case, the air bubbles from the bubbler 3 can be made to go upwards in such a way that the air bubbles from the bubbler 3 can be prevented from generating vortices since the air bubbles are vigorously generated from both portions of a first side 33 and a second side 35 of the tubing bubbler 31, and also owing to these synergistic effects. All the substrates W, therefore, can be uniformly treated by preventing treatment unevenness from being generated in the substrates W even locating at both ends because the air bubbles from the bubbler 3 can uniformly touch all the substrates W. COPYRIGHT: (C)2005,JPO&NCIPI |
