发明名称 |
Imprint lithography for superconductor devices |
摘要 |
One aspect of this disclosure relates to a method of building a superconductor device on a substrate, comprising depositing an imprint layer on at least a portion of the subdtrate. The imprint layer is imprinted to provide an imprinted portion of the imprint layer and a non-imprinted portion of the imprint layer. A superonductor layer is deposited on at least a portion of the imprint portion of the imprint layer.
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申请公布号 |
US2005197254(A1) |
申请公布日期 |
2005.09.08 |
申请号 |
US20050119034 |
申请日期 |
2005.04.30 |
申请人 |
STASIAK JAMES;KORNILOVICH PAVEL |
发明人 |
STASIAK JAMES;KORNILOVICH PAVEL |
分类号 |
G03F7/00;G06N99/00;H01L39/24;(IPC1-7):H01L39/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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