发明名称 Method of inspecting a semiconductor device and an apparatus thereof
摘要 A method of inspecting a sample in which the sample is inspected under a plurality of inspection conditions and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
申请公布号 US2005196033(A1) 申请公布日期 2005.09.08
申请号 US20050117336 申请日期 2005.04.29
申请人 发明人 HAMAMATSU AKIRA;NOGUCHI MINORI;OHSHIMA YOSHIMASA;NISHIYAMA HIDETOSHI;OKA KENJI;NINOMIYA TAKANORI;TANAKA MAKI;WATANABE KENJI;WATANABE TETSUYA;MORISHIGE YOSHIO
分类号 G01N21/956;G06T7/00;H01L21/66;(IPC1-7):G06K9/00 主分类号 G01N21/956
代理机构 代理人
主权项
地址