| 摘要 |
<P>PROBLEM TO BE SOLVED: To actualize detuning degree adjustment for an ultra small vibration-type gyro sensor element. <P>SOLUTION: Portions of a vibrator 11 formed out of a monocrystal silicon substrate 1, other than surfaces where a lower electrode 4a, a piezoelectric thin film 5a, and upper electrodes 6a, 6b, and 6c, are ground by means of reactive ion etching, dry isotropic ion etching, or crystal anisotropic etching, thereby obtaining a desired detuning degree. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
