| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of stably processing the sample of an object to be processed for a long time. <P>SOLUTION: In the plasma processing apparatus for processing the sample placed on a sample stage 150 located in the inside of a processing chamber 100 by using plasma produced in the processing chamber 100, at least one of members 3 freely attachably/detachably fitted to/from one side of the inner wall 1 of the processing chamber has a part coated by a material 31 different from that of the other parts. A material resistant to plasma made of Y<SB>2</SB>O<SB>3</SB>, Yb<SB>2</SB>O<SB>3</SB>, or YF<SB>3</SB>as the major component, or a mixture 31 of them is coated to the surface of the member 3 in contact with the plasma. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
