发明名称 |
HIGH SENSITIVITY RESIST COMPOSITIONS FOR ELECTRON-BASED LITHOGRAPHY |
摘要 |
The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the group consisting of dissolution-inhibiting acid generators, and (ii) a second radiation sensitive acid generator selected from the group consisting of unprotected acidic group-functionalized acid generators and acid labile group-protected acidic group-functionalized radiation sensitive acid generators; enables formation of high sensitivity resists suitable for use in EPL, EUV, soft x-ray, and other low energy intensity lithographic imaging applications. The resist compositions may be useful in other lithographic processes as well.
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申请公布号 |
KR20050089804(A) |
申请公布日期 |
2005.09.08 |
申请号 |
KR20057009775 |
申请日期 |
2005.05.30 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HUANG WU SONG;LI WENJIE;MOREAU WAYNE;MEDEIROS DAVID E.;PETRILLO KAREN E.;LANG ROBERT N.;ANGELOPOULOS MARIE |
分类号 |
G03F7/004;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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