发明名称 |
VARIABLE NUMERICAL APERTURE LARGE-FIELD UNIT-MAGNIFICATION PROJECTION SYSTEM |
摘要 |
An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The optical system includes a positive lens group having a positive subgroup of elements that includes at least a piano-convex element and a negative subgroup that includes at least a negative meniscus element. The lens subgroups are separated by a small air space. The positive and negative subgroups constitute a main lens group arranged adjacent to but spaced apart from a concave mirror along the mirror axis. The system also includes a variable aperture stop so that the system has a variable NA. A projection photolithography system that employs the optical system is also disclosed.
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申请公布号 |
KR20050089086(A) |
申请公布日期 |
2005.09.07 |
申请号 |
KR20057012543 |
申请日期 |
2005.07.01 |
申请人 |
ULTRATECH INC. |
发明人 |
MERCADO ROMEO I. |
分类号 |
G02B17/08;(IPC1-7):H01L21/027;G02B17/00;G02B27/42 |
主分类号 |
G02B17/08 |
代理机构 |
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地址 |
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