发明名称 HEAT TREATMENT SYSTEM AND HEAT TREATMENT METHOD
摘要 A heat treatment system comprising a reaction container having three zones divided vertically, a substrate holder, and heaters and control sections provided for respective zones on the side of the reaction container. Each control section is connected with a section for detecting the temperature of a zone being served. The temperature detecting section of a middle stage zone is also connected with control sections corresponding to the upper stage zone and the lower stage zone. Control sections of the upper stage zone and the lower stage zone operate a temperature detection value at the temperature detecting section of the middle stage zone as a temperature target value based on a temperature detection value of that zone at the time of carrying in the substrate holder and outputs a heater control signal.
申请公布号 KR20050088989(A) 申请公布日期 2005.09.07
申请号 KR20057002671 申请日期 2005.02.17
申请人 TOKYO ELECTRON LIMITED 发明人 EJIMA TOMOMI
分类号 H01L21/205;H01L21/22;(IPC1-7):H01L21/205 主分类号 H01L21/205
代理机构 代理人
主权项
地址